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离子束辅助沉积合成B—N薄膜的分析

江海 , 陶琨 , 李恒德

金属学报

用离子束辅助沉积(IBAD)技术合成氮化硼薄膜,红外吸收谱和透射电镜的观测结果显示,薄膜含有c—BN和h—BN相薄膜Knoop硬度值高达35GPa。逐层剥离的AES谱结果表明,薄膜表面存在氮离子的注入效应,薄膜由注入层、成分均匀层和离子束混合过渡层组成

关键词: 离子束辅助沉积 , BN film

PREPARATION OF B-N FILMS BY ION BEAM ASSISTED DEPOSITION

JIANG Hai TAO Kun LI Hengde Tsinghua University , Beijing , China lecturer , Department of Materials Science and Engineering , Tsinghua University , Beijing 100084 , China

金属学报(英文版)

BN films,synthesized by ion beam assisted deposition,were analysed by RBS,AES, IR spectra and TEM.Formatiom of c-BN phase was shown not only by IR spectra at absorption peak of 1100 cm~(-1),but also by electron diffraction pattern.The results of AES demonstrate an effect of N~+ implantation near the film surface.The deposited films consist of three layers,i.e.,ion implantation layer,film layer and mixed intermediatelayer, according to the difference of concentration.The micro-Knoop hardness of the film is 25—35 GPa.

关键词: ion beam assisted deposition , null

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